au.\*:("Société française du vide. comité couches minces, matériaux et technologie pour l'électronique")
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8e Colloque international sur les procédés plasma, 10-14 juin 1991, Antibes-Juan-Les-Pins, FranceLe Vide, les couches minces. 1991, Vol 47, Num 256, issn 0223-4335, SUPConference Proceedings
Transmetteur de mesure de pression partielle 600 A = Partial pressure measure transmitterMARTIN, B.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 390-392, issn 0223-4335, SUPConference Paper
Particle contamination in plasma processus : formation, detection and process concernsSELWYN, G. S.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 129-136, issn 0223-4335, SUPConference Paper
Optimisation du positionnement d'un substrat dans un système de dépôt par cation ionique = Optimization of substrate positioning in a ionic cation deposition systemWERNER, M.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 338-340, issn 0223-4335, SUPConference Paper
Assistance ionique : RF, Kaufman, ECR ou gridless = Ionic assistance: RF, Kaufman, ECR or gridlessLe Vide, les couches minces. 1991, Vol 47, Num 256, pp 404-405, issn 0223-4335, SUPConference Paper
New hard coatings grown from physical vapor deposition techniques : properties and industrial applicationsCOLL, B. F.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 155-170, issn 0223-4335, SUPConference Paper
Dispositif de chauffage des substrats dans les installations de dépôts sous vide = Device for substrate heating in vacuum deposition installationsJACQUES, F.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 398-400, issn 0223-4335, SUPConference Paper
Perspectives en gravure sèche des nouveaux réacteurs plasma : applications à la microélectronique = Future prospects in dry etching of new plasma reactorsPECCOUD, L.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 76-84, issn 0223-4335, SUPConference Paper
Microelectronics detox systemsPROUST, N.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 65-72, issn 0223-4335, SUPConference Paper
Active and passive spectroscopy in plasma deposition and plasma etchingSCHRAM, D. C.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 1-8, issn 0223-4335, SUPConference Paper
Evolution des générateurs micro-ondes plasma = Evolution of microwave plasma generatorsBERNARD, J. P.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 393-394, issn 0223-4335, SUPConference Paper
Thin film tri-electrode electroluminescent displayPORADA, Z. W.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 344-346, issn 0223-4335, SUPConference Paper
Thin films amorphous semiconductors for light and radiation detectionEQUER, B.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 192-200, issn 0223-4335, SUPConference Paper
Réalisation d'équipements de gravure et pulvérisation avec des changements de procédés entièrement automatisés grâce à la nouvelle ligne de générateurs de RF plasma products = Realization of etching and sputtering equipments with entirely automatized process changes owing to new class of generators of RF PLASMA PRODUCTSTUFFIN, G.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 395-397, issn 0223-4335, SUPConference Paper
L'épitaxie et la passivation des composés III - V, Plestin-les-Grèves, 24-26 avril 1990 = Epitaxy and passivation of III-V compounds, Plestin-les-Grèves, 24-26 April 1990Le Vide, les couches minces. 1990, Vol 45, Num 251, issn 0223-4335, 97 p.Conference Proceedings
Dry-etching monitoring of III-V heterostructures using laser reflectometry and optical emission spectroscopyCOLLOT, P; DIALLO, T.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 368-370, issn 0223-4335, SUPConference Paper
Numerical simulation of the effect of ion beam assistance on the structure and properties on thin C filmsANDRE, B; ROSSI, F.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 35-37, issn 0223-4335, SUPConference Paper
Analysis of an ECR-plasmaNEUMANN, G; KNAPP, H.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 59-61, issn 0223-4335, SUPConference Paper
Investigation of ECR discharge mechanisms based on the study of surface-wave-sustained magnetoplasmas : a systematic approachMARGOT, J; MOISAN, M.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 47-58, issn 0223-4335, SUPConference Paper
Spatially and time-resolved optical emission spectroscopy of silane and helium RF dischargesBÖHM, C; PERRIN, J.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 286-288, issn 0223-4335, SUPConference Paper
Influence de la température sur la structure et la texture de couches de TiN obtenues par pulvérisation cathodique magnetron = Effect of temperature on structure and texture of TiN layers obtained by magnetron cathodic sputteringCOMBADIERE, L; MACHET, J.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 186-188, issn 0223-4335, SUPConference Paper
Electron energy spectra at a negatively biased electrode in a sputtering dischargeJOUAN, P. Y; LEMPERIERE, G.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 271-273, issn 0223-4335, SUPConference Paper
Growth conditions, structure and properties of amorphous hydrogenated carbon films prepared by ion platingBEWILOGUA, K; RAU, B.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 216-222, issn 0223-4335, SUPConference Paper
Plasma deposition of SiO2 from TEOS and mixtures of TEOS with O2 and rare gasesGARCIA, P; CATHERINE, Y.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 201-203, issn 0223-4335, SUPConference Paper
Water vapour permeability and structure of plasma polymerized ethyleneTAKAHASHI, N; PELISSIER, V.Le Vide, les couches minces. 1991, Vol 47, Num 256, pp 356-358, issn 0223-4335, SUPConference Paper